Electronic Materials and  
Thin Films Lab
Teachers Day 05 Sept 2018
Welcome to EMTFL website
Our group works in the area of printed electronics and thin film deposition. We work on both fundamental and applied research, related to electronic device fabrication. We focus mainly on vapor deposition, solution processing, and wet chemical routes for synthesis and fabrication and use a variety of characterization techniques for structural and functional property measurments.   
Parasuraman S
Associate Professor  
Dept. of Metallurgical and Materials Engineering 
Indian Institute of Technology (IIT) - Madras  
Chennai - 600 036 

Email: swamnthn[at]iitm.ac.in 
Phone: +91 44 2257 4756 

New Academic Complex (NAC) 229  

NAC 213

Please use the headings given above to navigate through the website and know more about the group and the work.
Group Updates

  1. Anirban succeessfully completed his MS Synopsis. Congrats.
  2. Nitheesh successfully completed his Research Proposal seminar. Congrats. 
  3. Arul successfully completed his MS Synopsis. Congrats. 
  4. Anirban's work on patterned electroless nickel deposition has been accepted for publication in Surface and Coatings Technology. Nitheesh and Anjali are co-authors in this work. Yopu can access the article here.  
  5. Krishna Kumar has been awarded the Institute Research Award (IRA 2018-19) for his doctoral work. He has completed his PhD synopsis and submitted his thesis. Congrats.
  6. Nitheesh has filed his patent title, "A PRINTABLE WI-FI TRANSPARENT ANTENNA". The patent application no. is 201941012467. Filed on 29/03/2019. Dr. Debdutta Ray is one of the co-inventors of this patent. 
  7. Arulkumar has filed his patent titled, "A METHOD FOR FABRICATION OF METALLIC NANOWIRES BY GALVANIC DISPLACEMENT REACTION USING AAO TEMPLATES". The patent application no. is 201941009566. Filed on 12/03/2019. Dr. Lakshman Neelakantan is also one of the co-inventors of this patent. 
 ORCID: orcid.org/0000-0002-9821-3981.  

 Scopus Author ID:
Google profile:
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Curriculum vitae: click here.