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| Prof. Satyesh and his students have been granted a patent for the invention titled “Material and Method for Roughness Reduction of Substrates”.

Date

13 May 2025

We are happy to share that Prof. Satyesh and his students Mr. Allamula Ashok (MM20D016), Ms. Peela Lasya (MM22D011), and Mr. Daljin J ( MM22S007) have been granted a patent for the invention titled “Material and Method for Roughness Reduction of Substrates”. The Department of Metallurgical and Materials Engineering congratulates Prof. Satyesh and wish his students more success in future.